KAPTEOS PRODUCT LINE
The Value and Benefits of Electro-optic Technology
Kapteos Products
• eoSense™ Optic to Electro Converter
• eoProbe™ to measure E-field (EMF)
•• eoCal™ – eoProbe Calibration
•• eoLink™ – 100m Fiber optic extension
•• eoPod™ – eoProbe Articulated Arm and Stand
Kapteos – On-Site Training
• Applications (Target Markets)
• Antennas – Measurement of E-fields Emitted by Antennas• NFACS (Near Field Antenna Characterization Solution)
• 3D NFACS (Near Field Antenna Characterization Solution)
• Vectorial & Characterization of Ultra Compact Antennas
• EMC -Measurement of E-Fields in Electromagnetic Compatibility
• EMP – Time-resolved measurements of Electromagnetic Pulse
• High Temperature – Measurement in High Temperature
• High Voltage – Measurement of E-fields in High Voltage
• Measuring the E-Field around a Laptop
• MRI – Measurement of E-fields inside an MRI
• Plasma – Measurement of E-fields inside Plasma
• SAR – Specific Absorption Rate (SAR) assessment
• Online Software Simulation Tool – Determine Online, before you purchase, the value of the Kapteos Solution!
• FAQ’s – A wealth of Information!
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KAPTEOS TIME-RESOLVES MEASUREMENTS OT EMP
EMP – TIME-RESOLVED ABSOLUTE MEASUREMENTS OF GIANT ELECTROMAGNETIC PULSES
Measurement of giant EMP generated by intense laser-matter interaction
Kapteos has performed a test using a prototype probe to measure a magnetic field induced by a rail gun system.
This magnetic probe could measure H-Field up to few MA/m from 40 Hz to 50 kHz. Please click on the following Application Note to learn more about this.
Background
The ELI (European Extreme Light Infrastructure) enlisted Kapteos in a European ESFRI (European Strategy Forum on Research Infrastructures) project for the investigation of light-matter interactions at highest intensities and shortest time scales.
Specifically, the project was to measure E-Fields in a Giant EMP
The Project Test Environment consisted of:
• Ultra high electric (E) field expected
• Ultra short EMP expected
• Ultra harsh environment
– Extreme light fluence
– X-rays
– Single shot
– High vacuum
• Relativistic particles generation
– Radial E-field enhancement ← Liénard-Wiechert Liénard-Wiechert
• Experience chamber
– Faraday cage → multiple reflection problematic multiple reflection problematic
Probe specifications for EMP measurement
• Ultra Wide Band (from MHz → multiple reflection problematic 50 GHz)
– In accordance with specifications of best real time oscilloscopes (LeCroy, TekTronix, …)
• Long distance required from E-field transducer to digitizer
– High dispersion & absorption in RF cables
– EMC problematic (conducted and radiated interferences)
– Only solution → multiple reflection problematic optical link
• Short distance from target to E-field transducer
– Required for echoes suppression via time windowing
• Artefact free from
– X rays & Extreme optical fluences
Electro-optic probes (Kapteos eoProbe)
• Full dielectric, low permittivity
– Almost no interference with the E field to be measured
• 4 years collaboration with ENEA Frascati
– Group of Fabrizio Consoli
– Measurement with ABC laser
– – 30 J, 3 ns FWHM
• Specific sheath for probe shielding against
– Extreme light fluence
– X-rays artefacts
• Simultaneous of the 3 E-field components
– Less than 100 mm from target
– With spatial resolution < 10 mm
Presentation: Measurement of giant EMP generated by intense laser matter interaction